Model of a Filament Assisted CVD ReactorJ. Brcka
TEL US Holdings, Inc., Technology Development Center, Albany, New York, USA
In this presentation we are dealing with the computational fluid model of a Filament Assisted Chemical Vapor Deposition (FACVD) reactor. Proposed strategy in this study involved several steps: (a) development a computational model for FACVD process capable to describe and obtain with reasonable accuracy all relevant phenomena occurring in the reaction chamber; (b) validation the computational model predictions with experimental data; and (c) analyzing and testing the effects of process conditions, boundary conditions on deposition performance by model on overall performance of the FACVD reactor.